
Nyxel® Technology Generation 2
Nyxel® 2 technology opens new possibilities for applications that operate in near or total darkness, while reducing overall power consumption
QE for Nyxel® 2

Technology Benefits
Nyxel® 2 provides higher quality image capture, greater detection range and even lower light-source power requirements, enabling OMNIVISION’s image sensors to see even better and farther while extending battery life.



Technology Features
Nyxel® 2 further refines OMNIVISION’s revolutionary pixel architectures and processes to achieve new records for quantum efficiency in near-infrared (NIR) imaging while overcoming other challenges.
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Thicker Silicon Pixel ArchitectureBuilding on its successful first-generation technology, Nyxel® 2 further increases the silicon thickness to improve NIR imaging sensitivity by up to 25% at 940nm.
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Extended Deep Trench IsolationExtended DTI solves the cross-talk issue while retaining the modulation transfer function (MTF) levels of the first generation Nyxel® technology, without affecting the dark current.
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Re-optimized Scattering LayerWith wafer surface texture refinement, the proprietary Nyxel® scattering layer is now re-optimized to improve the extended photon path and increase the photon-to-electron conversion.
Applications
Nyxel® 2 technology expands NIR imaging performance and enables emerging applications with additional capabilities.
Product Solutions
OMNIVISION places its customers at the leading edge of imaging technology with its commitment to innovative, forward-thinking solutions.
What’s New
Stay up to date with all of OMNIVISION’s news, announcements and updates.